PL
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Stand for spectroscopic and ablation studies

The experimental apparatus is used to produce nanostructures and modify them. The system consists of two vacuum chambers and a laser with an optical system.

In the first chamber structures of any solid material can be made. It is evaporated by laser ablation by Nd: YAG pulsed laser of wavelength 266 nm (fourth harmonic). The process of evaporation occurs at very low pressure in the presence of air or buffer gas such as oxygen. The chamber is equipped with two interchangeable tables, making it possible to produce layers of two methods: PLD (pulsed laser deposition), or PLD with the configuration GLAD (glancing angle deposition).
In the second chamber, modifying the metal layers previously obtained on glass is possible. PLA method (pulse laser annealing) is applied. The annealing of the films for production of the nanoparticle structures is performed in ultra-vacuum by pulsed (pulse duration: 6 ns, pulse frequency: 2 Hz) radiation of the Nd:YAG laser operated at 266 nm and at fluencies in the range of 10-400 mJ/cm2. Selection of laser fluencies is obtained by changing the dimension of the laser spot and wedges.

 lab   lab

Optical system used in PLD and PLA techniques as well as vacuum chamber

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